Do you have a need for high-speed, high-sensitivity measurement of thickness irregularities in organic thin films for semiconductor？
Traditionally known for its high sensitivity, the optical film thickness measurement device “ellipsometer” has now achieved ultra-fast measurement through our unique photonic crystal
technology.

Differences from conventional ellipsometers

Conventional ellipsometers required the measurement target to be stationary.
Our ME/SE series ellipsometers can accurately measurements of samples on the move.
This provides overwhelming high speed.

Introduction of the ellipsometer, a film thickness and refractive index distribution measurement device.
https://www.photonic-lattice.com/cat_products/ellipsometric-measurement/

Application examples

Thickness distribution of spin-coated organic thin films.
Example of 3D display of film thickness distribution.

Resist film thickness distribution on mask glass.
Example of measuring micro irregularities.

Lineup

High-speed mapping ellipsometer　ME-210/ME-210-T

Compact ellipsometer　SE-101

Automation example

We can also propose systems that combine with automatic conveyance machines.
For measuring resist film thickness distribution on mask blanks.
High-speed mapping ellipsometer with automatic conveyance machine.

ME-210-ALMG

Compatible with standard specification SMIF pods.

An automatic opening/closing mechanism and an automatic conveyance mechanism realized fully automated measurement.

Demonstrations with actual equipment are now being accepted！！

We always have a high-speed mapping ellipsometer demo machine on hand.
We invite you to test its capabilities with a sample from your company(free of charge for the first time).